In a new development, scientist at Linkoping University have developed a method that can employ electrons in a plasma to generate thin films of metal to link transistors in electronic devices. This includes mobile phones, computers, and all other electronic devices.
Structurally, today, the processors in computers and phones comprise billions of minuscule transistors joined by thin metallic films. To ease out this need, scientists at Linkoping University have shown the possibility to create thin films of metals wherein free electrons in a plasma are allowed to take an active role.
Meanwhile, plasma is formed when energy is formed that sheds apart electrons from the atoms and molecules of a gas, to generate ionized gas. In the everyday life, plasma is used in plasma displays and fluorescent lamps. The research is available for access in the form of an article in the science journal JOURNAL of Vacuum Science & Technology.
Research Opens Avenues for Exciting Application Areas
“The research opens avenues for several exciting application areas,” says a professor of inorganic chemistry at the Department of physics, Chemistry, and Biology at Linkoping University. With the advent of the new method, it does not require to move the substrate between the vacuum chamber and a water bath. Meanwhile, the substrate on which the transistors are created move in a backward and forward motion, which is around 15 times per processor.
A common method to create thin films involves introducing molecular vapors containing atoms required for films in a vacuum cleaner. In the chamber, the molecular vapors react with each other and also with the surface on which the thin film is to be formed. The method a well-established one is known as chemical vapor deposition.